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双语推荐:M型钡铁氧体薄膜

采用有机金属裂解法在Pt/TiO2/SiO2/Si基板上制备M型钡铁氧体(BaM薄膜,并着重研究了螯合剂乙二胺四乙酸(EDTA)含量对BaM薄膜结构、磁性和微波性能的影响。研究发现,当EDTA∶(Ba2++Fe3+)=1(摩尔比)时,BaM薄膜形成较多的六角形状晶粒,而且磁性能和微波性能较佳,沿c轴生长的取向度高达0.91,饱和磁化强度Ms为302kA/m(μ0Ms=0.38T),在50GHz时铁磁共振线宽ΔH为22kA/m (277Oe)。这是因为适量的EDTA不仅在溶液挥发时能够阻止金属离子的分离和间歇性的沉淀,并且能够促进成形成均匀的前驱液,从而在前驱液分解时能促进形成BaM,在经过热处理后易形成沿c轴取向、具有六角形状晶粒的BaM薄膜
M-type barium ferrite thin films were fabricated on Pt/TiO2/SiO2/Si substrate by metal organic decomposition method, focusing on the effect of elhylene diamine tetraacetic acid on the structure, magnetic and microwave properties of BaM ferrite thin films. It is found that, when the mole ratio of EDTA∶(Ba2++Fe3+)=1 hexagonal grains are formed, and the BaM ferrite thin film has excellent magnetic and microwave properties:degree of orientation for c axis of up to 0.91, saturation magnetization Ms of 302kA/m and the ferromagnetic resonance linewith of 22kA/m (277Oe) at 50GHz. These results are due to the fact that appropriate amount of EDTA not only prevents the segregation or intermittent precipitation of metal ions from solution during evaporation but also helps the formation of uniform precursor solution, promoting formation of BaM during the decomposition of the precursor, which results in c-axis orientation of hexagonal BaM ferrite thin film after heat treatment.

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尖晶石铁氧体(CoFe2O4)因具有良好的电磁性质,广泛应用于计算机技术、航空航天及医学生物等领域。特别是钴铁氧体薄膜在磁电复合材料中具有良好的应用前景。本文基于密度泛函理论的第一性原理平面波赝势法,结合广义梯度近似,通过采用更接近于实验上外延生长的二维应变模,研究了钴铁氧体薄膜的结构稳定性、电子结构和磁性能。结果表明:在二维应变作用下,反尖晶石结构的钴铁氧体比正尖晶石结构的稳定,但是与平衡基态相比,两者能量差减小,这表明在应变作用下,八面体晶格中的Co2+离子与四面体晶格中的Fe3+离子更容易进行位置交换,形成混合结构的钴铁氧体;同时随着应变的增大,钴铁氧体的能带带隙减小,晶格中的原子磁矩发生变化,但总磁矩变化不明显。
Spinel ferrites, such as CoFe2O4, can be used in various fields such as computer technology, aerospace, and medical biotechnology due to their good electromagnetic properties. Although, CoFe2O4 thin films have good application prospects in the magnetoelectric composites, the effects of strain on the electronic structure and magnetic properties of cobalt ferrite film have not been reported. Through the use of two-dimensional strain model closer to the epitaxial growth experiments, the films of Cobalt ferrite are simulated on various substrates with a realistic biaxial strain model by first-principles plane-wave pseudopotential method based on density functional theory, and combined with the generalized gradient approximation in the paper. And the structural stabilities, electronic structures and magnetic properties of CoFe2O4 films are studied. The results show that the inverse spinel is still energetically favored under strain, but the energy difference decreases, thus Fe3+ions in the

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提出了铁氧体薄膜器件光刻多次涂胶新工艺,研究了涂覆次数对光刻胶的表面粗糙度、均匀性和厚度的影响。同时结合培烘试验,对一种实际电路基片进行了验证。试验结果表明:随着光刻胶涂覆次数的增加,光刻胶厚度逐渐增大,增加幅度逐渐减小,涂覆光刻胶的表面粗糙度有明显改善,均匀性也逐渐提高。当烘焙温度为50℃、烘焙时间为25min,光刻胶与基底的附着力、感光性和耐腐蚀性均能满足铁氧体器件薄膜电路制作工艺的要求。利用多次涂胶法可有效去除电路手工修补工艺,从而提高铁氧体薄膜器件的电路图形加工质量及效率。
Multiple spin-coating technology was proposed for ferrite film device lithograph, and influence of coating times on the surface rougnness, uniformity and thickness of photo-resist was investigated. At the same time, baking test was conducted on a practical circuit substrate. The experimental results show that, with increasing the number of coating photo-resist, the thickness of photo-resist increases, with a decreased increase amplitude, and both surface roughness and uniformity of photo-resist is improved obviously. When baking at 50℃for 25min, photo-resist adherence to the substrate, photo-sensitivity, and corrosion-resistance of the photo-resist can meet the requirements of thin film circuit production process of ferrite devices. The use of multiple coating can omit circuit manual repairing, resultantly improving the quality and efficiency of the circuit graphics processing of ferrite thin film devices.

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采用反应直流磁控溅射法在镍锌铁氧体基片上制备 Cu掺杂的 TaN薄膜。通过调节氮流量,研究了不同氮流量下Cu掺杂对TaN薄膜电性能的影响。由XRD结果可见,TaN薄膜中掺杂Cu可在2θ=54°出现Cu3 N相,在2θ=57°出现CuN6相。氮流量的增加造成的结果:Cu掺杂的TaN薄膜厚度逐渐减小,薄膜的方阻和电阻温度系数(TCR)绝对值均增加。与无Cu掺杂的TaN薄膜的方阻和 TCR作了比较,发现 TaN薄膜掺杂 Cu可有效改善薄膜的方阻和TCR。
TaN thin films with copper doping were prepared on Ni-Zn ferrite substrate by the reactive DC mag-netron sputtering method.With different nitrogen content,the influences of Cu doping on the electrical properties of the samples were investigated by adj usting nitrogen content.The X-ray diffraction (XRD)results show that Cu3 N and CuN6 phases appear at 2θof 54°and 57°in copper doping TaN thin films,respectively.The results caused by nitrogen content increase are that the square resistance and the absolute value of temperature coefficient of resistance (TCR)increase with the thickness decrease.Compared with the square resistance and the TCR of the TaN thin films without Cu doping,the square resistance and the TCR of Cu doping TaN thin films were improved effectively.

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文中采用磁控溅射方式在铁氧体基片上制备了微带隔离器的多层膜结构。通过带金属掩模版溅射电阻层,避免了对薄膜电阻的光刻和刻蚀;通过使用铜靶和湿法刻蚀,克服了对溅射用金靶、反应离子刻蚀等工艺技术和设备的依赖。该新工艺方法简化了镍铬薄膜电阻的制作,降低了薄膜电路的制造成本,可应用于集成电阻的薄膜电路基板的研制。
The multilayer film structure of microstrip isolator was prepared by magnetron sputtering on ferrite substrate. The photolithography and etching process of the iflm resistor was avoided by sputtering of resistor layer with metal mask. The preparation process also avoided the dependence on sputtering Au target and reactive ion etching technologies by using Cu target and wet etching. This new process simpliifed the fabrication of NiCr iflm resistor and reduced the cost of thin iflm circuits. It can be applied in fabricating iflm circuits with integrated resistor.

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研究了基于高饱和磁感应强度的铁硅铝软磁材料的复合软磁材料薄膜的低温成工艺和磁性能。绝缘包覆工艺上,使用高电阻率的锰锌铁氧体软磁粉末做绝缘剂。粘结工艺上,使用水玻璃做粘结剂,低温固化粘结。与传统工艺比,低温成工艺与微加工工艺兼容。应用该工艺制作了软磁薄膜,采用超景深三维显微系统VHX-2000观测复合材料的微观结构;运用振动样品磁强计测试薄膜的静态磁性能参数;使用交流磁化率测量仪测试薄膜动态磁性能参数。针对软磁磁粉颗粒度、绝缘包覆、粘结成等不同工艺因素,制作了薄膜样品,总结了不同工艺因素对薄膜综合磁性能的影响。
This paper introduces the general magnetic properties and a new low temperature modeling process of a special compound soft magnetic film based on FeSiAl powder.In this experiment,the ZnMn ferrite soft mag-netic powder with high resistivity was insulator.Waterglass was used as binder for low temperature modeling. Compared with conventional process,low temperature modeling process was compatible with micro-nano fabri-cation.In the end,we use microscope system VHX-2000 to observe the micro structure of the compound mate-rial.The static magnetic parameters will be tested by using the module of PPMS (physical property measure-ment system)called VSM (vibrating sample magnetometer).The dynamic magnetic parameters will be tested by the ACMS (alternating current magnetization susceptibility)instrument.In the end,we make the final prac-tical sample with different technical elements.These elements include particle size of the powder,the content of insulator as well as the content of the binder.A

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吸波材料是一种重要的特种材料,对解决电磁污染、电磁兼容以及提升武器装备的隐身能力起着重要的作用.从吸波材料的应用出发,介绍了稀土增强材料吸波能力的机理,然后分别从稀土元素掺杂铁氧体材料、稀土过渡金属间化合物、稀土锰基氧化物LSMO材料以及稀土掺杂磁性薄膜几方面,对吸波材料中这类重要的稀土吸波材料的研究现状进行了论述.
@@@@Electromagnetic wave absorbing material is an important special material, which plays a crucial role in solving the problem of electromagnetic pollution and electromagnetic compatibility, and enhancing the stealth ability of weapons. Based on the application of electromagnetic wave absorbing material, the rare earth element doped ferrite, rare earth transitionmetal intermetallic compounds, rare earth manganese oxides LSMO materials, and rare-earth doped magnetic film were introduced.

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针对13.56MHz RFID系统大面积平面螺旋线圈天线存在的缺陷,提出了一种用于13.56MHz频段的新RF-MEMS微天线,并使用HFSS软件进行了仿真和设计,同时采用MEMS工艺实现器件制作。该微天线由螺线管线圈及高性能铁氧体薄膜组成,总体尺寸小于10mmx6.7mmx0.46mm。该微天线灵敏度达到了36.2mV/μT,使用电感值为1.6μH的读卡器线圈与匹配谐振后的微天线进行耦合,在6mm处该微天线的谐振电压达到7.1V,同时将集成了标签芯片及谐振电容的微天线与符合 ISO14443标准的读卡器进行通信,其通信距离达到12mm
In this paper, a novel RF-MEMS antenna for 13.56MHz applications is presented to resolve the problems exist in the large area spiral antenna. RF-MEMS antenna is simulated and designed by means of high frequency structure simulator (HFSS) software. By MEMS process, the micro antenna has been fabricated, which consists of solenoid-type coil and high performance ferrite film, and has a measurement of less than 10mm×6.7mm×0.46mm. Test results show that the sensitivity of the micro antenna achieves 36.2mV/μT. Voltages up to 7.1 V were obtained at the resonant micro antenna from a 1.6μH reader coil at 6 mm distance. The assembled micro antenna with RFID chip and capacitor was tested using an ISO14443 type RFID reader at 13.56 MHz and successful communication was established at a distance of 12 mm.

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