采用两维PIC/MCC模型模拟了氮气微空心阴极放电以及轰击离子(N+2,N+)的钛阴极溅射.主要计算了氮气微空心阴极放电离子(N+2,N+)及溅射原子Ti的行为分布,并研究了溅射Ti原子的热化过程.结果表明:在模拟条件下,空心阴极效应是负辉区叠加的电子震荡;在对应条件下,微空心较传统空心放电两种离子(N+2,N+)密度均大两个量级,两种离子的平均能量的分布及大小几乎相同;在放电空间N+的密度约为N+2的1/6,最大能量约大2倍;在不同参数(P, T, V)下,轰击阴极内表面的氮离子(N+2,N+)的密度近似均匀,其平均能量几乎相等;从阴极溅射出的Ti原子的初始平均能量约6.8 eV,离开阴极约0.15 mm处几乎完全被热化.模拟结果为N2微空心阴极放电等离子体特性的认识提供了参考依据.

The nitrogen microhollow cathode discharge and Ti cathode sputtering, bombarded by ions (N+2 , N+), have been studied using a two-dimensional PIC/MCC model. The behavior of ions (N+2 , N+) and sputtered atom (Ti), and the thermalization process of the sputtered atoms in a nitrogen microhollow cathode discharge are simulated. The results show that hollow cathode effect is due to electron oscillations in the overlapping negative glow under our simulation condition. The densities of ions (N+2 , N+) in the microhollow cathode discharge are two orders in magnitude greater than that in the conventional hollow cathode discharge;but the distributions and sizes of the mean energy of the ions (N+2 , N+) are almost the same. The density of N+2 is fivefold as much as that of N+ in the microdischarge space; however, the maximum of mean energy of the latter is twice larger than the former. For various parameters (P,T,V), the densities of ions(N+2 , N+) bombarding the cathode internal surface are alm

低温等离子体表面处理可以有效克服液相处理法存在的环境污染、耗能大和成本高的缺点,对材料表面进行清洗、活化和接枝处理,而设计一个合理的低温等离子体放电结构能够较好地改进表面处理的质量.通过建立CRFHCP空心阴极等离子体放电的数学模型,分析影响低温等离子体放电的关键因素,并设计了不同电极配置方式、样品位置和不同远区空心阴极结构的众多方案.通过接触角测定、表面能计算、SEM照片等方式,对不同方案下处理前后的疏水性PP薄膜形态结构进行表征分析.实验结果发现:远区径向喷嘴式空心阴极等离子体放电结构处理的薄膜表面比其他处理方式具有较小的接触角和较大的表面能.这表明采用优化设计的CRFHCP空心阴极等离子体放电结构,可以较其他结构更为有效地改善材料表面的亲水性能.

Low temperature plasma can effectively clean and activate material surface without the disadvantages in liquid phase treatment such as environmental pollution ,high energy consump-tion and high cost ,so it can improve surface treatment quality by designing a appropriate plasma discharge structure .This paper built a mathematical model of CRFHCP hollow cathode plasma discharge .After analyzing key factors influencing the plasma discharge ,various hollow cathode plasma discharge scheme with different electrode configuration mode ,different sample position and different removed hollow cathode structure were designed . Through the determination of contact angle ,surface energy calculation and SEM photos ,the hydrophobic PP film morphology was characterized before and after plasma treatment under different plasma discharge scheme . According to the experimental results ,there are smaller contact angle and larger surface energy in removed hollow cathode plasma discharge structure with radial

利用流体-亚稳态原子传输混合模型研究了氩气矩形空心阴极放电稳态时的参数.数值计算得到了压强为10 Torr时的电势、电子、离子和亚稳态氩原子密度以及电子平均能量的分布.结果表明电子和离子密度峰值为4.7×1012 cm?3,亚稳态原子密度峰值为2.1×1013 cm?3.本文同时对流体-亚稳态原子传输混合模型和单一流体模型模拟得到的放电参数进行了比较.结果表明,分步电离是新电子产生的重要来源,亚稳态原子对空心阴极放电特性有重要影响.与单一流体模型相比,混合模型计算得到的电子密度升高,阴极鞘层宽度和电子平均能量降低.

The characteristics of rectangular hollow cathode discharge are studied based on a fluid model combined with a transport model for metastable Ar atoms in argon. The distribution of potential, density of electrons and ions, and the density of metastable atoms are calculated at a pressure of 10 Torr. The peak density of electron and ion is 4.7×1012 cm?3, and the peak density of metastable atoms is 2.1 × 1013 cm?3. Results obtained in terms of fluid-metastable hybrid model are compared with that in terms of the fluid model, which show that the electron produced by stepwise ionization is one of the important source of new electrons, and the metastable atoms have an obvious effect on the hollow cathode discharge. Compared with the results calculated in terms of fluid model, the density of electrons obtained in terms of hybrid model increases, and the depth of cathode sheath and the averaged electron energy decrease.

等离子体源离子注入与沉积技术作为一种可生产高结合力、高致密度涂层的真空镀膜技术,具有广阔的应用前景,尤其适用于高载荷工况下服役的功能涂层制备.该技术中金属等离子体源是关键,而现有的脉冲阴极弧源结构复杂,且由于伴随"金属液滴"而需要增加过滤装置.本文研究了另一种简单结构的金属等离子体源备选一高功率脉冲磁控溅射源(HPPMS)的放电特性,采用等离子体发射光谱仪探索了不同的耦合高压对HPPMS放电靶电流特性和等离子体特性的作用.发现耦合高压对HPPMS放电有明显的促进作用,相同靶电压下的放电强度大幅增加,相对于金属放电,耦合高压对气体放电的促进作用更加明显,但在自溅射为主的高压放电阶段对金属放电的促进作用明显增强.讨论了耦合高压对HPPMS放电的增强机制,发现耦合高压自辉光放电、耦合高压和HPPMS电压构成双向负压形成的空心阴极效应,以及耦合高压鞘层改善的双极扩散效应都对HPPMS放电的增强有明显作用.

Plasma source ion implantation and deposition, as an effective technology to produce functional coatings with high adhesion and density, possesses the wide application prospect, especially in the deposition of coatings that work in high loading service conditions. The key component of this technology is the metal plasma source, which is now based on pulsed cathodic arc with complex source structure and magnetic filtration because of the “macro-droplets” in the ion flux. In this paper, we present another metal plasma source, high power pulsed magnetron sputtering (HPPMS), and investigate the discharge characteristics at different coupling high-voltages by optical emission spectroscopy. The results show that significant improvements are found in the discharge target current and main particles in the plasma. The improvement in gas discharge by the coupling high-voltage is greater than in metal discharge which could increase obviously in the self-sputtering stage with higher ta